In advanced lithography, semiconductor fabrication, and nano-optics, Extreme Ultraviolet Lithography (EUVL) has emerged as the essential technology enabling sub-7nm process nodes. Our company specializes in the design, manufacturing, precision alignment, and system-level integration of EUV optical systems and high-performance lenses, offering end-to-end engineering support from concept to mass production.
Core EUV Optical Architecture
As shown in the schematic, our EUV projection system includes:
- Synchrotron-based EUV Light Source (λ ≈ 14 nm)
- High-Precision Mask Transmission Mechanism
- Reflective Imaging Optics Using Secondary & Primary Mirrors
- Photoresist-Coated Wafer Stage
Each component is optimized for maximum pattern fidelity, minimal aberration, and nanometer-level accuracy.
Advanced Lens Manufacturing Capabilities
We are equipped with state-of-the-art facilities for the fabrication of EUV-grade optical components:
- 🔹 Aspheric Lens Grinding and Polishing: Surface figure accuracy better than λ/50, surface roughness < 1nm RMS.
- 🔹 Multilayer Reflective Coating: Custom high-reflectivity multilayer coatings (e.g., Mo/Si stacks) for EUV wavelengths, deposited via high-vacuum magnetron sputtering and ion-assisted techniques.
- 🔹 Material Optimization with CDGM Library: Selection of advanced fused silica, silicon, and CDGM glass ensures excellent thermal and optical stability.
High-Precision Assembly & Alignment
Assembly precision directly determines EUV system performance. We offer comprehensive alignment and calibration services:
- 🔹 Zygo Interferometry Systems: For ultra-precise surface error analysis and mirror alignment.
- 🔹 5-Axis Precision Alignment Platforms: Enables nanometer-level adjustments for complex multi-element systems.
- 🔹 Laser-Based Collimation and Optical Axis Correction: Incorporating proprietary auto-alignment algorithms for system-level optical optimization.
- 🔹 Cleanroom Assembly & Vacuum-Compatible Packaging: ISO Class 5 cleanroom with anti-vibration tables ensures contamination-free integration.
Integrated R&D and Rapid Prototyping
- In-house design capability using Zemax and Code V.
- Full closed-loop process: Design → Fabrication → Testing → Alignment.
- Rapid prototyping turnaround in 3–4 weeks.
- Custom OEM/ODM development and optomechanical integration services.
Applications
Our high-precision lenses and EUV optical systems are widely used in:
- Semiconductor fabrication (EUV exposure systems for ≤7nm nodes)
- Nanometer-scale metrology and research platforms
- Mask transmission and alignment systems
- EUV photoresist testing tools
- Reflective lens modules for advanced imaging
